Analytic solutions for optimized ellipsometric measurements of interfaces and surface layers in thin film structures

Samuel A. Alterovitz; George H. Bu-Abbud; John A. Woollam

doi:10.1016/0040-6090(85)90159-2

Analytic solutions for optimized ellipsometric measurements of interfaces and surface layers in thin film structures

Samuel A. Alterovitz, George H. Bu-Abbud, John A. Woollam

Electrical & Computer Engineering

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

The maximum experimental sensitivity in ellipsometric measurements for samples that include a composite (two-layer) film on a substrate is treated with mathematical generality. A detailed theoretical computation is made for a system consisting of a moderately thick film on a substrate and including either an interface layer between the film and substrate or a thin surface layer on top of the moderately thick film. Analytical conditions for the sensitivity of p or s wave suppression are determined. For the air/SiO₂/Si system a numerical calculation is performed to determine the optimum sensitivity for interfacial layer studies.

Original language	English (US)
Pages (from-to)	183-196
Number of pages	14
Journal	Thin Solid Films
Volume	123
Issue number	3
DOIs	https://doi.org/10.1016/0040-6090(85)90159-2
State	Published - Jan 18 1985

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/0040-6090(85)90159-2

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title = "Analytic solutions for optimized ellipsometric measurements of interfaces and surface layers in thin film structures",

abstract = "The maximum experimental sensitivity in ellipsometric measurements for samples that include a composite (two-layer) film on a substrate is treated with mathematical generality. A detailed theoretical computation is made for a system consisting of a moderately thick film on a substrate and including either an interface layer between the film and substrate or a thin surface layer on top of the moderately thick film. Analytical conditions for the sensitivity of p or s wave suppression are determined. For the air/SiO2/Si system a numerical calculation is performed to determine the optimum sensitivity for interfacial layer studies.",

author = "Alterovitz, {Samuel A.} and Bu-Abbud, {George H.} and Woollam, {John A.}",

note = "Funding Information: This research was supported by Grant 3-154 from the National Aeronautics and Space Administration Lewis Research Center and Air Force Contract F33601-81-MJ869.",

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AU - Alterovitz, Samuel A.

AU - Bu-Abbud, George H.

AU - Woollam, John A.

N1 - Funding Information: This research was supported by Grant 3-154 from the National Aeronautics and Space Administration Lewis Research Center and Air Force Contract F33601-81-MJ869.

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N2 - The maximum experimental sensitivity in ellipsometric measurements for samples that include a composite (two-layer) film on a substrate is treated with mathematical generality. A detailed theoretical computation is made for a system consisting of a moderately thick film on a substrate and including either an interface layer between the film and substrate or a thin surface layer on top of the moderately thick film. Analytical conditions for the sensitivity of p or s wave suppression are determined. For the air/SiO2/Si system a numerical calculation is performed to determine the optimum sensitivity for interfacial layer studies.

AB - The maximum experimental sensitivity in ellipsometric measurements for samples that include a composite (two-layer) film on a substrate is treated with mathematical generality. A detailed theoretical computation is made for a system consisting of a moderately thick film on a substrate and including either an interface layer between the film and substrate or a thin surface layer on top of the moderately thick film. Analytical conditions for the sensitivity of p or s wave suppression are determined. For the air/SiO2/Si system a numerical calculation is performed to determine the optimum sensitivity for interfacial layer studies.

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Analytic solutions for optimized ellipsometric measurements of interfaces and surface layers in thin film structures

Abstract

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