Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry (Scientific Reports, (2020), 10, 1, (10392), 10.1038/s41598-020-66409-8)

Ufuk Kilic; Alyssa Mock; Derek Sekora; Simeon Gilbert; Shah Valloppilly; Giselle Melendez; Natale Ianno; Marjorie Langell; Eva Schubert; Mathias Schubert

doi:10.1038/s41598-021-86624-1

Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry (Scientific Reports, (2020), 10, 1, (10392), 10.1038/s41598-020-66409-8)

Ufuk Kilic, Alyssa Mock, Derek Sekora, Simeon Gilbert, Shah Valloppilly, Giselle Melendez, Natale Ianno, Marjorie Langell, Eva Schubert, Mathias Schubert

Electrical & Computer Engineering

Research output: Contribution to journal › Comment/debate › peer-review

Abstract

Giselle Melendez was omitted from the author list in the original version of this Article. This has now been corrected in the PDF and HTML versions of the Article, and in the accompanying Supplementary Information file. The Author Contributions section now reads: U.K. and D.S. performed ALD depositions of Al2O3, SiO2, TiO2, and WO3 thin films. U.K. took AFM images, collected in-situ SE data and designed the dynamic dual box model for in-situ SE data analysis. A.M. and G.M. contributed to the SE data analysis. S.V. and U.K. performed XRD analysis. S.G. and U.K. performed XPS analysis. N.I. and M.L. made contributions to the discussions over the experimental results. The manuscript was edited and approved by all authors. E.S. and M.S. supervised the project.

Original language	English (US)
Article number	7157
Journal	Scientific reports
Volume	11
Issue number	1
DOIs	https://doi.org/10.1038/s41598-021-86624-1
State	Published - Dec 2021

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Kilic, U., Mock, A., Sekora, D., Gilbert, S., Valloppilly, S., Melendez, G., Ianno, N., Langell, M., Schubert, E., & Schubert, M. (2021). Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry (Scientific Reports, (2020), 10, 1, (10392), 10.1038/s41598-020-66409-8). Scientific reports, 11(1), Article 7157. https://doi.org/10.1038/s41598-021-86624-1

Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry (Scientific Reports, (2020), 10, 1, (10392), 10.1038/s41598-020-66409-8). / Kilic, Ufuk; Mock, Alyssa; Sekora, Derek et al.
In: Scientific reports, Vol. 11, No. 1, 7157, 12.2021.

Research output: Contribution to journal › Comment/debate › peer-review

Kilic, U, Mock, A, Sekora, D, Gilbert, S, Valloppilly, S, Melendez, G, Ianno, N, Langell, M, Schubert, E & Schubert, M 2021, 'Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry (Scientific Reports, (2020), 10, 1, (10392), 10.1038/s41598-020-66409-8)', Scientific reports, vol. 11, no. 1, 7157. https://doi.org/10.1038/s41598-021-86624-1

Kilic U, Mock A, Sekora D, Gilbert S, Valloppilly S, Melendez G et al. Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry (Scientific Reports, (2020), 10, 1, (10392), 10.1038/s41598-020-66409-8). Scientific reports. 2021 Dec;11(1):7157. doi: 10.1038/s41598-021-86624-1

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abstract = "Giselle Melendez was omitted from the author list in the original version of this Article. This has now been corrected in the PDF and HTML versions of the Article, and in the accompanying Supplementary Information file. The Author Contributions section now reads: U.K. and D.S. performed ALD depositions of Al2O3, SiO2, TiO2, and WO3 thin films. U.K. took AFM images, collected in-situ SE data and designed the dynamic dual box model for in-situ SE data analysis. A.M. and G.M. contributed to the SE data analysis. S.V. and U.K. performed XRD analysis. S.G. and U.K. performed XPS analysis. N.I. and M.L. made contributions to the discussions over the experimental results. The manuscript was edited and approved by all authors. E.S. and M.S. supervised the project.",

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AU - Mock, Alyssa

AU - Sekora, Derek

AU - Gilbert, Simeon

AU - Valloppilly, Shah

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AU - Schubert, Eva

AU - Schubert, Mathias

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N2 - Giselle Melendez was omitted from the author list in the original version of this Article. This has now been corrected in the PDF and HTML versions of the Article, and in the accompanying Supplementary Information file. The Author Contributions section now reads: U.K. and D.S. performed ALD depositions of Al2O3, SiO2, TiO2, and WO3 thin films. U.K. took AFM images, collected in-situ SE data and designed the dynamic dual box model for in-situ SE data analysis. A.M. and G.M. contributed to the SE data analysis. S.V. and U.K. performed XRD analysis. S.G. and U.K. performed XPS analysis. N.I. and M.L. made contributions to the discussions over the experimental results. The manuscript was edited and approved by all authors. E.S. and M.S. supervised the project.

AB - Giselle Melendez was omitted from the author list in the original version of this Article. This has now been corrected in the PDF and HTML versions of the Article, and in the accompanying Supplementary Information file. The Author Contributions section now reads: U.K. and D.S. performed ALD depositions of Al2O3, SiO2, TiO2, and WO3 thin films. U.K. took AFM images, collected in-situ SE data and designed the dynamic dual box model for in-situ SE data analysis. A.M. and G.M. contributed to the SE data analysis. S.V. and U.K. performed XRD analysis. S.G. and U.K. performed XPS analysis. N.I. and M.L. made contributions to the discussions over the experimental results. The manuscript was edited and approved by all authors. E.S. and M.S. supervised the project.

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Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry (Scientific Reports, (2020), 10, 1, (10392), 10.1038/s41598-020-66409-8)

Abstract

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