Giselle Melendez was omitted from the author list in the original version of this Article. This has now been corrected in the PDF and HTML versions of the Article, and in the accompanying Supplementary Information file. The Author Contributions section now reads: U.K. and D.S. performed ALD depositions of Al2O3, SiO2, TiO2, and WO3 thin films. U.K. took AFM images, collected in-situ SE data and designed the dynamic dual box model for in-situ SE data analysis. A.M. and G.M. contributed to the SE data analysis. S.V. and U.K. performed XRD analysis. S.G. and U.K. performed XPS analysis. N.I. and M.L. made contributions to the discussions over the experimental results. The manuscript was edited and approved by all authors. E.S. and M.S. supervised the project.
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