Challenges in Controlled Thermal Deposition of Organic Diradicals

Tobias Junghoefer, Nolan M. Gallagher, Kubandiran Kolanji, Erika Giangrisostomi, Ruslan Ovsyannikov, Thomas Chassé, Martin Baumgarten, Andrzej Rajca, Arrigo Calzolari, Maria Benedetta Casu

Research output: Contribution to journalArticlepeer-review

11 Scopus citations


We demonstrate that it is possible to evaporate diradicals in a controlled environment obtaining thin films in which the diradical character is preserved. However, evaporation represents a challenge. The presence of two radical sites makes the molecules more reactive also in the case of very stable single radicals. We have explored the parameters that play a role in this phenomenon. We found that the higher the formation energies of the crystal, the more difficult is the evaporation of intact radicals. Large delocalization of the unpaired electrons helps the diradical to stand evaporation. We have also investigated the lifetime of the films when exposed to X-rays or air. The onset of thermal degradation plays a role in the film lifetime. In fact, the lower the evaporation temperature with respect to the onset temperature, the longer is the film lifetime. The evaporation of different diradicals can be successfully addressed considering our findings.

Original languageEnglish (US)
Pages (from-to)2019-2028
Number of pages10
JournalChemistry of Materials
Issue number6
StatePublished - Mar 23 2021

ASJC Scopus subject areas

  • General Chemistry
  • General Chemical Engineering
  • Materials Chemistry


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