Challenges in Controlled Thermal Deposition of Organic Diradicals

Tobias Junghoefer, Nolan M. Gallagher, Kubandiran Kolanji, Erika Giangrisostomi, Ruslan Ovsyannikov, Thomas Chassé, Martin Baumgarten, Andrzej Rajca, Arrigo Calzolari, Maria Benedetta Casu

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Engineering & Materials Science

Chemical Compounds