TY - JOUR
T1 - Characterization of TiBN films grown by ion beam assisted deposition
AU - Aouadi, S. M.
AU - Namavar, F.
AU - Gorishnyy, T. Z.
AU - Rohde, S. L.
N1 - Funding Information:
The authors would like to thank Professor I. Petrov, Dr R. Haash, and Dr N. Finnegan of the University of Illinois Champaign-Urbana for providing XPS, RBS and nanoindentation facilities, supported by the US Department of Energy under grant DEFG02-96-ER45439. This work was sponsored by NSF (CMS-9358108) and (CMS-9978789), and by the University of Nebraska-Lincoln's Center for Materials Research and Analysis and the Center for Microelectronics and Optical Materials Research.
PY - 2002/10/22
Y1 - 2002/10/22
N2 - This paper presents one of the first attempts to measure and model the ellipsometric data for ternary nitride coatings in general and TiBN coatings in particular. TiBN coatings with a functionally graded underlayer of Ti/TiN have been deposited at low temperatures ( <200 °C) on a silicon substrate using ion beam assisted deposition (IBAD). The coating selected for detailed analysis had a total thickness of 1.5±0.2 μm. The deposited structure was characterized post-deposition using X-ray diffraction (XRD), atomic force microscopy (AFM), Rutherford backscattering (RBS), X-ray photoelectron spectroscopy (XPS), infrared spectroscopic ellipsometry (IR-SE), and visible-light spectroscopic ellipsometry (VIS-SE). The primary phases (TiB2, TiN, and BN) in the film were identified using XRD. The surface morphology and nanocrystalline nature of the coating (grain size of 5-7 nm) were deduced using AFM. The chemical composition and phase composition of the sample was determined from RBS and XPS measurements and was subsequently deduced from the analysis of the VIS-SE data. The refractive indices for the constituent phases were deduced from the investigation of TiB2. TiN and BN single layers with SE. Good correlation was observed between RBS, XPS and VIS-SE for the data on the TiBN sample. XPS and IR-SE suggested that BN formed in the amorphous form. The chemical composition study using these various techniques shows that in-situ SE is a potential technique to control the growth of ternary nitride coatings. Finally, the mechanical properties of the coating were evaluated using a nanoindenter. The hardness and elastic modulus were measured to be 42 GPa and 325 GPa, respectively.
AB - This paper presents one of the first attempts to measure and model the ellipsometric data for ternary nitride coatings in general and TiBN coatings in particular. TiBN coatings with a functionally graded underlayer of Ti/TiN have been deposited at low temperatures ( <200 °C) on a silicon substrate using ion beam assisted deposition (IBAD). The coating selected for detailed analysis had a total thickness of 1.5±0.2 μm. The deposited structure was characterized post-deposition using X-ray diffraction (XRD), atomic force microscopy (AFM), Rutherford backscattering (RBS), X-ray photoelectron spectroscopy (XPS), infrared spectroscopic ellipsometry (IR-SE), and visible-light spectroscopic ellipsometry (VIS-SE). The primary phases (TiB2, TiN, and BN) in the film were identified using XRD. The surface morphology and nanocrystalline nature of the coating (grain size of 5-7 nm) were deduced using AFM. The chemical composition and phase composition of the sample was determined from RBS and XPS measurements and was subsequently deduced from the analysis of the VIS-SE data. The refractive indices for the constituent phases were deduced from the investigation of TiB2. TiN and BN single layers with SE. Good correlation was observed between RBS, XPS and VIS-SE for the data on the TiBN sample. XPS and IR-SE suggested that BN formed in the amorphous form. The chemical composition study using these various techniques shows that in-situ SE is a potential technique to control the growth of ternary nitride coatings. Finally, the mechanical properties of the coating were evaluated using a nanoindenter. The hardness and elastic modulus were measured to be 42 GPa and 325 GPa, respectively.
KW - Ellipsometry
KW - Ion beam assisted deposition
KW - Nanocrystal
KW - Nitride
KW - Rutherford backscattering
KW - X-ray photoelectron spectroscopy
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U2 - 10.1016/S0257-8972(02)00330-4
DO - 10.1016/S0257-8972(02)00330-4
M3 - Article
AN - SCOPUS:0037159175
SN - 0257-8972
VL - 160
SP - 145
EP - 151
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
IS - 2-3
ER -