Controllable anisotropic wetting characteristics on silicon patterned by slit-based spatial focusing of femtosecond laser

Tianyuan Wang, Lan Jiang, Xin Li, Jie Hu, Qingsong Wang, Sen Ye, Hao Zhang, Yongfeng Lu

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

We propose a promising method to fabricate controllable anisotropic morphologies in which the slit-based spatial focusing of femtosecond laser is used to create an elliptical-shaped intensity distribution at focal plane, inducing elliptical-shaped morphology with micro/nano-dual-scale structures. Our study shows that 1) by increasing slit width, minor axis increases while major axis and axial ratio decrease; 2) with fixed slit width and laser fluence above the threshold, axial ratio is independent of irradiation pulse number; and 3) when polarization direction is changed from 0° to 90°, the axial ratio of anisotropic morphology declines. As a case study, large-area periodic anisotropic hierarchical structures are fabricated with the bidirectional anisotropic wetting.

Original languageEnglish (US)
Pages (from-to)25732-25741
Number of pages10
JournalOptics Express
Volume24
Issue number22
DOIs
StatePublished - Oct 31 2016

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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