Controlled defect creation and removal in graphene and MoS2 monolayers

D. W. Li, Q. M. Zou, X. Huang, H. Rabiee Golgir, K. Keramatnejad, J. F. Song, Z. Y. Xiao, L. S. Fan, X. Hong, L. Jiang, J. F. Silvain, S. Sun, Y. F. Lu

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