Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques

Ufuk Klllç, Derek Sekora, Alyssa Mock, Rafał Korlacki, Shah Valloppilly, Elena M. Echeverría, Natale Ianno, Eva Schubert, Mathias Schubert

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Fingerprint Dive into the research topics of 'Critical-point model dielectric function analysis of WO<sub>3</sub> thin films deposited by atomic layer deposition techniques'. Together they form a unique fingerprint.

Physics & Astronomy