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Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
Ufuk Klllç, Derek Sekora, Alyssa Mock, Rafał Korlacki, Shah Valloppilly, Elena M. Echeverría, Natale Ianno, Eva Schubert, Mathias Schubert
Research output: Contribution to journal › Article › peer-review
1
Scopus
citations