“Diamondlike” carbon films: Optical absorption, dielectric properties, and hardness dependence on deposition parameters

V. Nataraian; Joel D. Lamb; John A. Woollam; David C. Liu; Daniel A. Gulino

doi:10.1116/1.573280

“Diamondlike” carbon films: Optical absorption, dielectric properties, and hardness dependence on deposition parameters

V. Nataraian, Joel D. Lamb, John A. Woollam, David C. Liu, Daniel A. Gulino

Electrical & Computer Engineering

Research output: Contribution to journal › Article › peer-review

28 Scopus citations

Abstract

An rf plasma deposition system was used to prepare amorphous “diamondlike” carbon films. The source gases for the rf system include methane, ethylene, propane, and propylene, and the parameters varied were power, dc substrate bias, and postdeposition anneal temperature. Films were deposited on various substrates. The main diagnostics were optical absorption in the visible and in the infrared, admittance as a function of frequency, hardness, and Auger and ESCA spectroscopy. Band gap is found to depend strongly on rf power level and band gaps up to 2.7 eV and hardness up to 7 Mohs were found. There appears to be an inverse relationship between hardness and optical band gap.

Original language	English (US)
Pages (from-to)	681-685
Number of pages	5
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	3
Issue number	3
DOIs	https://doi.org/10.1116/1.573280
State	Published - May 1985

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1116/1.573280

Cite this

@article{ddf18e38bcbb4f7390a76f4878840637,

title = "“Diamondlike” carbon films: Optical absorption, dielectric properties, and hardness dependence on deposition parameters",

abstract = "An rf plasma deposition system was used to prepare amorphous “diamondlike” carbon films. The source gases for the rf system include methane, ethylene, propane, and propylene, and the parameters varied were power, dc substrate bias, and postdeposition anneal temperature. Films were deposited on various substrates. The main diagnostics were optical absorption in the visible and in the infrared, admittance as a function of frequency, hardness, and Auger and ESCA spectroscopy. Band gap is found to depend strongly on rf power level and band gaps up to 2.7 eV and hardness up to 7 Mohs were found. There appears to be an inverse relationship between hardness and optical band gap.",

author = "V. Nataraian and Lamb, {Joel D.} and Woollam, {John A.} and Liu, {David C.} and Gulino, {Daniel A.}",

year = "1985",

month = may,

doi = "10.1116/1.573280",

language = "English (US)",

volume = "3",

pages = "681--685",

journal = "Journal of Vacuum Science and Technology A",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "3",

}

TY - JOUR

T1 - “Diamondlike” carbon films

T2 - Optical absorption, dielectric properties, and hardness dependence on deposition parameters

AU - Nataraian, V.

AU - Lamb, Joel D.

AU - Woollam, John A.

AU - Liu, David C.

AU - Gulino, Daniel A.

PY - 1985/5

Y1 - 1985/5

N2 - An rf plasma deposition system was used to prepare amorphous “diamondlike” carbon films. The source gases for the rf system include methane, ethylene, propane, and propylene, and the parameters varied were power, dc substrate bias, and postdeposition anneal temperature. Films were deposited on various substrates. The main diagnostics were optical absorption in the visible and in the infrared, admittance as a function of frequency, hardness, and Auger and ESCA spectroscopy. Band gap is found to depend strongly on rf power level and band gaps up to 2.7 eV and hardness up to 7 Mohs were found. There appears to be an inverse relationship between hardness and optical band gap.

AB - An rf plasma deposition system was used to prepare amorphous “diamondlike” carbon films. The source gases for the rf system include methane, ethylene, propane, and propylene, and the parameters varied were power, dc substrate bias, and postdeposition anneal temperature. Films were deposited on various substrates. The main diagnostics were optical absorption in the visible and in the infrared, admittance as a function of frequency, hardness, and Auger and ESCA spectroscopy. Band gap is found to depend strongly on rf power level and band gaps up to 2.7 eV and hardness up to 7 Mohs were found. There appears to be an inverse relationship between hardness and optical band gap.

UR - http://www.scopus.com/inward/record.url?scp=84914757218&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84914757218&partnerID=8YFLogxK

U2 - 10.1116/1.573280

DO - 10.1116/1.573280

M3 - Article

AN - SCOPUS:84914757218

SN - 0734-2101

VL - 3

SP - 681

EP - 685

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

IS - 3

ER -

“Diamondlike” carbon films: Optical absorption, dielectric properties, and hardness dependence on deposition parameters

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this