“Diamondlike” carbon films: Optical absorption, dielectric properties, and hardness dependence on deposition parameters

V. Nataraian, Joel D. Lamb, John A. Woollam, David C. Liu, Daniel A. Gulino

Research output: Contribution to journalArticlepeer-review

27 Scopus citations

Abstract

An rf plasma deposition system was used to prepare amorphous “diamondlike” carbon films. The source gases for the rf system include methane, ethylene, propane, and propylene, and the parameters varied were power, dc substrate bias, and postdeposition anneal temperature. Films were deposited on various substrates. The main diagnostics were optical absorption in the visible and in the infrared, admittance as a function of frequency, hardness, and Auger and ESCA spectroscopy. Band gap is found to depend strongly on rf power level and band gaps up to 2.7 eV and hardness up to 7 Mohs were found. There appears to be an inverse relationship between hardness and optical band gap.

Original languageEnglish (US)
Pages (from-to)681-685
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume3
Issue number3
DOIs
StatePublished - May 1985

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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