Direct writing of graphene patterns on insulating substrates under ambient conditions

Wei Xiong, Yun Shen Zhou, Wen Jia Hou, Li Jia Jiang, Yang Gao, Li Sha Fan, Lan Jiang, Jean Francois Silvain, Yong Feng Lu

Research output: Contribution to journalArticle

52 Scopus citations

Abstract

To unleash the full potential of graphene in electronics and optoelectronics, high-quality graphene patterns on insulating substrates are required. However, existing methods generally follow a "synthesis + patterning" strategy, which are time consuming and costly for fabricating high-quality graphene patterns on desired substrates. We developed a nanofabrication process to deposit high-quality graphene patterns directly on insulating substrates via a solid-phase laser direct writing (LDW) process. Open-air and room-temperature fabrication of graphene patterns on insulating substrates has been achieved via a femtosecond LDW process without graphene transfer and patterning. Various graphene patterns, including texts, spirals, line arrays, and integrated circuit patterns, with a feature line width of 800 nm and a low sheet resistance of 205 ohm/sq, were fabricated. The LDW method provides a facile and cost-effective way to fabricate complex and high-quality graphene patterns directly on target substrates, which opens a door for fabricating various advanced functional devices.

Original languageEnglish (US)
Article number4892
JournalScientific reports
Volume4
DOIs
StatePublished - May 8 2014

ASJC Scopus subject areas

  • General

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    Xiong, W., Zhou, Y. S., Hou, W. J., Jiang, L. J., Gao, Y., Fan, L. S., Jiang, L., Silvain, J. F., & Lu, Y. F. (2014). Direct writing of graphene patterns on insulating substrates under ambient conditions. Scientific reports, 4, [4892]. https://doi.org/10.1038/srep04892