TY - JOUR
T1 - Disorder-activated infrared modes and surface depletion layer in highly Si-doped hexagonal GaN
AU - Kasic, A.
AU - Schubert, M.
AU - Kuhn, B.
AU - Scholz, F.
AU - Einfeldt, S.
AU - Hommel, D.
PY - 2001/4/1
Y1 - 2001/4/1
N2 - Three infrared-active low-polar modes are reported for highly Si-doped hexagonal (α-) GaN. The 0.8-1.6 μm thick films, grown by metal organic vapor phase epitaxy or molecular beam epitaxy on (0001) sapphire substrates, were studied by infrared spectroscopic ellipsometry. For GaN epilayers with free-electron concentration N≥8×1018 cm-3 we observe, besides the usual GaN transverse-optical lattice modes and coupled longitudinal-optical phonon-plasmon modes, a band of additional modes at 567.4±2.5, 752.5±0.9, and 855.0±0.9 cm-1. We tentatively assign the first one to the disorder-activated high E2 GaN mode and the third mode to an acoustic-optical combination band, whereas the origin of the second mode remains unclear. Furthermore, the ellipsometric spectra of highly n-conductive Si-doped GaN reveal thin carrier-depleted regions at the sample surface.
AB - Three infrared-active low-polar modes are reported for highly Si-doped hexagonal (α-) GaN. The 0.8-1.6 μm thick films, grown by metal organic vapor phase epitaxy or molecular beam epitaxy on (0001) sapphire substrates, were studied by infrared spectroscopic ellipsometry. For GaN epilayers with free-electron concentration N≥8×1018 cm-3 we observe, besides the usual GaN transverse-optical lattice modes and coupled longitudinal-optical phonon-plasmon modes, a band of additional modes at 567.4±2.5, 752.5±0.9, and 855.0±0.9 cm-1. We tentatively assign the first one to the disorder-activated high E2 GaN mode and the third mode to an acoustic-optical combination band, whereas the origin of the second mode remains unclear. Furthermore, the ellipsometric spectra of highly n-conductive Si-doped GaN reveal thin carrier-depleted regions at the sample surface.
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U2 - 10.1063/1.1344913
DO - 10.1063/1.1344913
M3 - Article
AN - SCOPUS:0035308399
SN - 0021-8979
VL - 89
SP - 3720
EP - 3724
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 7
ER -