Abstract
Variations of the thermal expansion coefficient of thin polyimide films as a function of film thickness (40-260 nm) have been measured by monitoring film thickness as a function of temperature using X-ray reflectivity from samples of poly(pyromellitic dianhydride oxydianiline) (PMDA-ODA) films spin-cast onto silicon wafers. The effective expansion coefficient of the film decreases with decreasing thickness and is consistent with a bilayer model in which an interfacial region of constant thickness is formed for each film. The expansion coefficient of this surface or interfacial region is less than one-third the coefficient of the interior of the films. A simple method is described whereby the thermal expansion coefficient may be determined by reflectivity.
Original language | English (US) |
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Pages (from-to) | 7135-7140 |
Number of pages | 6 |
Journal | Langmuir |
Volume | 13 |
Issue number | 26 |
DOIs | |
State | Published - Dec 24 1997 |
Externally published | Yes |
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Spectroscopy
- Electrochemistry