Electronic structure and properties of sputtered Ta-Cu films

K. D. Aylesworth, S. S. Jaswal, M. A. Engelhardt, Z. R. Zhao, D. J. Sellmyer

Research output: Contribution to journalArticle

10 Scopus citations

Abstract

Films of TaxCu1-x have been produced in a co-sputtering system with dc-and rf-sputtering guns and a substrate attached to a rapidly rotating, water-cooled table. Samples were produced in the composition range 0.01.

Original languageEnglish (US)
Pages (from-to)2426-2432
Number of pages7
JournalPhysical Review B
Volume37
Issue number5
DOIs
StatePublished - 1988

ASJC Scopus subject areas

  • Condensed Matter Physics

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    Aylesworth, K. D., Jaswal, S. S., Engelhardt, M. A., Zhao, Z. R., & Sellmyer, D. J. (1988). Electronic structure and properties of sputtered Ta-Cu films. Physical Review B, 37(5), 2426-2432. https://doi.org/10.1103/PhysRevB.37.2426