Abstract
Site-directed electrochemical deposition of pinhole free, low-κ dielectric thin films on graphene is described for the first time. Specifically, we demonstrate the heterogeneous electrochemical polymerization of phenol to form thin (3-4 nm) layers of poly(phenylene oxide) (PPO) on monolayer graphene samples prepared by micromechanical exfoliation and chemical vapor deposition growth. We demonstrate the reliability of depositing PPO films simultaneously on a large number of devices, and selected individual graphene flakes/devices. The performance of top-gated field effect transistor devices described herein demonstrates the utility of electrodeposited PPO films as a top-gate dielectric.
Original language | English (US) |
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Pages (from-to) | 157-165 |
Number of pages | 9 |
Journal | Chemistry of Materials |
Volume | 27 |
Issue number | 1 |
DOIs | |
State | Published - Jan 13 2015 |
ASJC Scopus subject areas
- General Chemistry
- General Chemical Engineering
- Materials Chemistry