Ellipsometric studies of the diffusion of automic oxygen through silicon dioxide thin films

Bhola N. De; Kazem Memarzadeh; Agus Julianto; John Woollam; Therese M. Dever

doi:10.2514/3.25166

Ellipsometric studies of the diffusion of automic oxygen through silicon dioxide thin films

Bhola N. De, Kazem Memarzadeh, Agus Julianto, John Woollam, Therese M. Dever

Electrical & Computer Engineering

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

In this paper we describe the application of variable angle spectroscopic ellipsometry to the study of diffusion of atomic oxygen through SiO₂. Data are found to be well fit to the universal growth parabola, and the diffusion coefficient is estimated to be 10⁻⁵ cm²/min.

Original language	English (US)
Pages (from-to)	1065-1066
Number of pages	2
Journal	AIAA Journal
Volume	28
Issue number	6
DOIs	https://doi.org/10.2514/3.25166
State	Published - Jun 1990

ASJC Scopus subject areas

Aerospace Engineering

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title = "Ellipsometric studies of the diffusion of automic oxygen through silicon dioxide thin films",

abstract = "In this paper we describe the application of variable angle spectroscopic ellipsometry to the study of diffusion of atomic oxygen through SiO2. Data are found to be well fit to the universal growth parabola, and the diffusion coefficient is estimated to be 10−5 cm2/min.",

author = "De, {Bhola N.} and Kazem Memarzadeh and Agus Julianto and John Woollam and Dever, {Therese M.}",

note = "Funding Information: This research was supported by NASA Lewis Grant NAGS-95.",

year = "1990",

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AU - De, Bhola N.

AU - Memarzadeh, Kazem

AU - Julianto, Agus

AU - Woollam, John

AU - Dever, Therese M.

N1 - Funding Information: This research was supported by NASA Lewis Grant NAGS-95.

PY - 1990/6

Y1 - 1990/6

N2 - In this paper we describe the application of variable angle spectroscopic ellipsometry to the study of diffusion of atomic oxygen through SiO2. Data are found to be well fit to the universal growth parabola, and the diffusion coefficient is estimated to be 10−5 cm2/min.

AB - In this paper we describe the application of variable angle spectroscopic ellipsometry to the study of diffusion of atomic oxygen through SiO2. Data are found to be well fit to the universal growth parabola, and the diffusion coefficient is estimated to be 10−5 cm2/min.

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Ellipsometric studies of the diffusion of automic oxygen through silicon dioxide thin films

Abstract

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