In this paper we describe the application of variable angle spectroscopic ellipsometry to the study of diffusion of atomic oxygen through SiO2. Data are found to be well fit to the universal growth parabola, and the diffusion coefficient is estimated to be 10−5 cm2/min.
|Original language||English (US)|
|Number of pages||2|
|State||Published - Jun 1990|
ASJC Scopus subject areas
- Aerospace Engineering