Abstract
A METHOD FOR OPTIMIZING THE SENSITIVITY OF ELLIPSOMETRIC MEASUREMENTS FOR THIN DIELECTRIC FILMS ON SEMICONDUCTORS IS DESCRIBED IN SIMPLE PHYSICAL TERMS. THE TECHNIQUE IS DEMONSTRATED FOR THE CASE OF SPUTTERED SILICON NITRIDE FILMS ON GALLIUM ARSENIDE IN NONDESTRUCTIVE MEASUREMENT OF FILM PROPERTIESBY ASSUMING ONE- OR TWO-LAYER MODELS.
Original language | English (US) |
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Pages (from-to) | 163-177 |
Number of pages | 15 |
Journal | APPL PHYS COMMUN |
Volume | V 1 |
Issue number | N 2 |
State | Published - 1981 |
Externally published | Yes |
ASJC Scopus subject areas
- Engineering(all)