Enhanced magnetic properties of bit patterned magnetic recording media by trench-filled nanostructure

Chulmin Choi; Daehoon Hong; Young Oh; Kunbae Noh; Jin Yeol Kim; Leon Chen; Sy Hwang Liou; Sungho Jin

doi:10.3365/eml.2010.09.113

Enhanced magnetic properties of bit patterned magnetic recording media by trench-filled nanostructure

Chulmin Choi, Daehoon Hong, Young Oh, Kunbae Noh, Jin Yeol Kim, Leon Chen, Sy Hwang Liou, Sungho Jin

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

The structure and properties of nanoscale magnetic island arrays for bit patterned media (BPM) have been studied. A periodic Si nano-island array was fabricated by nano-imprint-lithography (NIL), with the trench-filling and flattening achieved by resist spin coating followed by reactive ion back-etching. A Co/Pd multilayer magnetic media with a perpendicular anisotropy was then sputtered and lifted-off so that the processed nanostructure array now has the magnetic material only on the top of the pillars. This process significantly improved the magnetic characteristics of BPM. A planarization by hydrogen silsesquioxane filling reduced the tribological interference of the protruding nanoisland heights in BPM.

Original language	English (US)
Pages (from-to)	113-116
Number of pages	4
Journal	Electronic Materials Letters
Volume	6
Issue number	3
DOIs	https://doi.org/10.3365/eml.2010.09.113
State	Published - Sep 2010

Keywords

Bit patterned media
Filling and planarization
Nano imprint lithography

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials

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title = "Enhanced magnetic properties of bit patterned magnetic recording media by trench-filled nanostructure",

abstract = "The structure and properties of nanoscale magnetic island arrays for bit patterned media (BPM) have been studied. A periodic Si nano-island array was fabricated by nano-imprint-lithography (NIL), with the trench-filling and flattening achieved by resist spin coating followed by reactive ion back-etching. A Co/Pd multilayer magnetic media with a perpendicular anisotropy was then sputtered and lifted-off so that the processed nanostructure array now has the magnetic material only on the top of the pillars. This process significantly improved the magnetic characteristics of BPM. A planarization by hydrogen silsesquioxane filling reduced the tribological interference of the protruding nanoisland heights in BPM.",

keywords = "Bit patterned media, Filling and planarization, Nano imprint lithography",

author = "Chulmin Choi and Daehoon Hong and Young Oh and Kunbae Noh and Kim, {Jin Yeol} and Leon Chen and Liou, {Sy Hwang} and Sungho Jin",

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AU - Choi, Chulmin

AU - Hong, Daehoon

AU - Oh, Young

AU - Noh, Kunbae

AU - Kim, Jin Yeol

AU - Chen, Leon

AU - Liou, Sy Hwang

AU - Jin, Sungho

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AB - The structure and properties of nanoscale magnetic island arrays for bit patterned media (BPM) have been studied. A periodic Si nano-island array was fabricated by nano-imprint-lithography (NIL), with the trench-filling and flattening achieved by resist spin coating followed by reactive ion back-etching. A Co/Pd multilayer magnetic media with a perpendicular anisotropy was then sputtered and lifted-off so that the processed nanostructure array now has the magnetic material only on the top of the pillars. This process significantly improved the magnetic characteristics of BPM. A planarization by hydrogen silsesquioxane filling reduced the tribological interference of the protruding nanoisland heights in BPM.

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