Abstract
The structure and properties of nanoscale magnetic island arrays for bit patterned media (BPM) have been studied. A periodic Si nano-island array was fabricated by nano-imprint-lithography (NIL), with the trench-filling and flattening achieved by resist spin coating followed by reactive ion back-etching. A Co/Pd multilayer magnetic media with a perpendicular anisotropy was then sputtered and lifted-off so that the processed nanostructure array now has the magnetic material only on the top of the pillars. This process significantly improved the magnetic characteristics of BPM. A planarization by hydrogen silsesquioxane filling reduced the tribological interference of the protruding nanoisland heights in BPM.
Original language | English (US) |
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Pages (from-to) | 113-116 |
Number of pages | 4 |
Journal | Electronic Materials Letters |
Volume | 6 |
Issue number | 3 |
DOIs | |
State | Published - Sep 2010 |
Keywords
- Bit patterned media
- Filling and planarization
- Nano imprint lithography
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials