Abstract
A strong, room-temperature, 1.54 μm emission from erbium-implanted at 190 keV into red-emitting porous silicon is demonstrated. Luminescence data showed that the intensity of infrared (IR) emission from Er implanted porous Si annealed at ≤ 650 °C, was a few orders of magnitude stronger than Er implanted quartz produced under identical conditions, and was almost comparable to IR emission from In0.53Ga0.47. As material which is used for commercial light-emitting diodes.
Original language | English (US) |
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Pages (from-to) | 375-380 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 358 |
State | Published - 1995 |
Event | Proceedings of the 1994 MRS Fall Meeting - Boston, MA, USA Duration: Nov 28 1994 → Nov 30 1994 |
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering