Etching of 10boron with SF 6-based electron cyclotron resonance plasmas for pillar-structured thermal neutron detectors

L. F. Voss, C. E. Reinhardt, R. T. Graff, A. M. Conway, R. J. Nikolić, N. Deo, C. L. Cheung

Research output: Contribution to journalArticle

12 Scopus citations

Abstract

Isotopically enriched 10boron for use in pillar-structured neutron detectors was successfully etched in an electron cyclotron resonance (ECR) plasma using SF 6-based plasmas. The effects of radio frequency (RF) power, ECR power, gas flow rate, H 2 and O 2 incorporation into the plasma, and gas mixture ratios were examined. Etch rates up to approximately 1.35 μm/min were realized. In addition, etch morphology was examined, and the final shape of 10boron-coated pillars could be controlled through the etch gas mixture utilized. Selectivity to the underlying Si structure was apparent from scanning electron microscopy (SEM) micrographs of completed etches.

Original languageEnglish (US)
Pages (from-to)263-267
Number of pages5
JournalJournal of Electronic Materials
Volume39
Issue number3
DOIs
StatePublished - Mar 2010

Keywords

  • Boron
  • Detector
  • Etch
  • Neutron
  • Plasma
  • Radiation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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