Fast growth of graphene patterns by laser direct writing

J. B. Park, W. Xiong, Y. Gao, M. Qian, Z. Q. Xie, M. Mitchell, Y. S. Zhou, G. H. Han, L. Jiang, Y. F. Lu

Research output: Contribution to journalArticlepeer-review

91 Scopus citations

Abstract

Rapid single-step fabrication of graphene patterns was developed using laser-induced chemical vapor deposition (LCVD). A laser beam irradiates a thin nickel foil in a CH4 and H2 environment to induce a local temperature rise, thereby allowing the direct writing of graphene patterns in precisely controlled positions at room temperature. Line patterns can be achieved with a single scan without pre- or postprocesses. Surprisingly, the growth rate is several thousand times faster than that of general CVD methods. The discovery and development of the LCVD growth process provide a route for the rapid fabrication of graphene patterns for various applications.

Original languageEnglish (US)
Article number123109
JournalApplied Physics Letters
Volume98
Issue number12
DOIs
StatePublished - Mar 21 2011

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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