Femtosecond Bessel-beam-assisted high-aspect-ratio microgroove fabrication in fused silica

Liangliang Zhao, Feng Wang, Lan Jiang, Yongfeng Lu, Weiwei Zhao, Jun Xie, Xiaowei Li

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

A simple and repeatable method to fabricate high-aspect-ratio (HAR) and high-quality microgrooves in silica is reported. The method consists of two steps: (1) formation of laser-modified regions by femtosecond Bessel beam irradiation, and (2) removing laser-modified regions through HF etching. Uniform, straight microgrooves can be fabricated and the highest aspect ratio that can be reached is ~52. The phenomenon is attributed to the uniform energy distribution in the long propagation distance, which leads to the long and uniform laser-modified regions and subsequent HF acid etching of laser-modified regions with high selectivity. This method will have potential applications in fabrication of HAR microgrooves in transparent materials.

Original languageEnglish (US)
Article number041405
JournalChinese Optics Letters
Volume13
Issue number4
DOIs
StatePublished - Apr 10 2015

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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