Femtosecond Bessel-beam-assisted high-aspect-ratio microgroove fabrication in fused silica

Liangliang Zhao, Feng Wang, Lan Jiang, Yongfeng Lu, Weiwei Zhao, Jun Xie, Xiaowei Li

Research output: Contribution to journalArticle

4 Scopus citations


A simple and repeatable method to fabricate high-aspect-ratio (HAR) and high-quality microgrooves in silica is reported. The method consists of two steps: (1) formation of laser-modified regions by femtosecond Bessel beam irradiation, and (2) removing laser-modified regions through HF etching. Uniform, straight microgrooves can be fabricated and the highest aspect ratio that can be reached is ~52. The phenomenon is attributed to the uniform energy distribution in the long propagation distance, which leads to the long and uniform laser-modified regions and subsequent HF acid etching of laser-modified regions with high selectivity. This method will have potential applications in fabrication of HAR microgrooves in transparent materials.

Original languageEnglish (US)
Article number041405
JournalChinese Optics Letters
Issue number4
StatePublished - Apr 10 2015

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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