Femtosecond laser drilling of high aspect ratio 1 μm holes in silicon

Dennis R. Alexander, Brian Mihulka, David Doerr

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations


There is a need in many scientific and manufacturing processes to drill small diameter holes with high aspect ratios in both brittle materials as well as metals. Femtosecond lasers operating at 795 nm or frequency doubled to 400 nm provide a unique tool for carrying out these processes. In this work, the femtosecond laser nanomachining facilities at the University of Nebraska is used to drill 1 μm holes in Si/SiO2 with aspect ratios > 8. The quality of the cut and the small nanoparticles are discussed. Two methods of eliminating the unwanted particles around the cut are discussed.

Original languageEnglish (US)
Pages (from-to)383-393
Number of pages11
JournalProceedings of SPIE - The International Society for Optical Engineering
Issue numberI
StatePublished - 2002
Externally publishedYes
EventHigh-Power Laser Ablation IV - Taos, United States
Duration: Apr 22 2002Apr 26 2002


  • Femtosecond
  • Laser ablation
  • Lasers
  • Micromachining
  • Nanomachining
  • Semiconductor processing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


Dive into the research topics of 'Femtosecond laser drilling of high aspect ratio 1 μm holes in silicon'. Together they form a unique fingerprint.

Cite this