Ferroelectric polymer Langmuir-Blodgett films for a nonvolatile memory applications

Stephen Ducharme, Timothy J. Reece, Christina M. Othon, R. K. Rannow

Research output: Contribution to journalArticlepeer-review

149 Scopus citations


We review the potential for integrating ferroelectric polymer Langmuir-Blodgett (LB) films with semiconductor technology to produce nonvolatile ferroelectric random-access memory (NV-FRAM or NV-FeRAM) and data-storage devices. The prototype material is a copolymer consisting of 70% vinylidene fluoride (VDF) and 30% trifluoroethylene (TrFE), or P(VDF-TrFE 70:30). Recent work with LB films and more conventional solvent-formed films shows that the VDF copolymers are promising materials for nonvolatile memory applications. The prototype device is the metal-ferroelectric-insulator-semiconductor (MFIS) capacitance memory. Field-effect transistor (FET)-based devices are also discussed. The LB films afford devices with low-voltage operation, but there are two important technical hurdles that must be surmounted. First, an appropriate method must be found to control switching dynamics in the LB copolymer films. Second, the LB technology must be scaled up and incorporated into the semiconductor-manufacturing process, but since there is no precedent for mass production of LB films, it is difficult to project how long this will take.

Original languageEnglish (US)
Pages (from-to)720-735
Number of pages16
JournalIEEE Transactions on Device and Materials Reliability
Issue number4
StatePublished - Dec 2005


  • Ferroelectric memory
  • Ferroelectric polymer
  • Langmuir-Blodgett (LB) films
  • Nonvolatile memory

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Safety, Risk, Reliability and Quality
  • Electrical and Electronic Engineering


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