Free electron behavior in InN: On the role of dislocations and surface electron accumulation

V. Darakchieva, T. Hofmann, M. Schubert, B. E. Sernelius, B. Monemar, P. O.Å Persson, F. Giuliani, E. Alves, H. Lu, W. J. Schaff

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Abstract

The free electron behavior in InN is studied on the basis of decoupled bulk and surface accumulation electron densities in InN films measured by contactless optical Hall effect. It is shown that the variation in the bulk electron density with film thickness does not follow the models of free electrons generated by dislocation-associated nitrogen vacancies. This finding, further supported by transmission electron microscopy results, indicates the existence of a different thickness-dependent doping mechanism. Furthermore, we observe a noticeable dependence of the surface electron density on the bulk density, which can be exploited for tuning the surface charge in future InN based devices.

Original languageEnglish (US)
Article number022109
JournalApplied Physics Letters
Volume94
Issue number2
DOIs
StatePublished - Jan 23 2009

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Darakchieva, V., Hofmann, T., Schubert, M., Sernelius, B. E., Monemar, B., Persson, P. O. Å., Giuliani, F., Alves, E., Lu, H., & Schaff, W. J. (2009). Free electron behavior in InN: On the role of dislocations and surface electron accumulation. Applied Physics Letters, 94(2), [022109]. https://doi.org/10.1063/1.3065030