Abstract
Being able to accurately select the angle of incidence and spectral range for measurements makes ellipsometry a very powerful tool for materials, surface and interface analysis. The technique is fast, totally computer automated and can be performed at atmospheric pressure. It is totally non-invasive and is sensitive to fractions of atom layer thicknesses. We illustrate the power of variable angle spectroscopic ellipsometry with three examples: optical coatings; surface roughness and wetting; electric field effects in semiconductor studies.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 279-283 |
| Number of pages | 5 |
| Journal | Materials Science and Engineering B |
| Volume | 5 |
| Issue number | 2 |
| DOIs | |
| State | Published - Jan 1990 |
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering
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Woollam, J. A., & Snyder, P. G. (1990). Fundamentals and applications of variable angle spectroscopic ellipsometry. Materials Science and Engineering B, 5(2), 279-283. https://doi.org/10.1016/0921-5107(90)90069-N