Generalized ellipsometry of complex mediums in layered systems

Mathias Schubert, Alexander Kasic, Tino Hofmann, Volker Gottschalch, Jürgen Off, Ferdinand Scholz, Eva Schubert, Horst Neumann, Ian Hodgkinson, Matthew Arnold, Wayne Dollase, Craig M. Herzinger

Research output: Contribution to journalArticle

18 Scopus citations

Abstract

A new global approach, called "Generalized Ellipsometry", is now capable to characterize the optical and structural properties of general anisotropic layered systems, including absorption, and can be applied, in general, to determine the linear response tensor elements for wavelengths from the far infrared to the deep ultra violet. This technique enables new insights into physical phenomena of layered anisotropic mediums, and can provide precise structural and optical data of novel compound materials. Experimental results are presented for stibnite single crystals as example for an arbitrary biaxial absorbing material, a wurtzite GaN thin film with uniaxial anisotropy grown on sapphire, a spontaneously atomically ordered III-V semiconductor alloy thin film, and a sculptured titanium dioxide film with symmetrically dielectric tensor properties.

Original languageEnglish (US)
Pages (from-to)264-276
Number of pages13
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4806
DOIs
StatePublished - Jan 1 2002

Keywords

  • Anisotropic optical constants
  • Bulk and thin film birefringence
  • Generalized ellipsometry
  • Optical Jones matrix
  • Phonon modes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Schubert, M., Kasic, A., Hofmann, T., Gottschalch, V., Off, J., Scholz, F., Schubert, E., Neumann, H., Hodgkinson, I., Arnold, M., Dollase, W., & Herzinger, C. M. (2002). Generalized ellipsometry of complex mediums in layered systems. Proceedings of SPIE - The International Society for Optical Engineering, 4806, 264-276. https://doi.org/10.1117/12.472993