Abstract
The goal of this study was to show that in situ spectroscopic ellipsometry (SE) is a production worthy technique for process monitoring and control of PVD binary and ternary nitride films. To achieve this goal, monolithic coatings of Cr-N, Ti-N, Ti-B-N, and Cr-B-N were deposited by ion beam assisted evaporation. Ex situ SE was used successfully to identify the chemical composition of films grown under different deposition conditions. The SE compositions were found to correlate with X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering (RBS) results.
Original language | English (US) |
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Pages (from-to) | 9-12 |
Number of pages | 4 |
Journal | Proceedings, Annual Technical Conference - Society of Vacuum Coaters |
State | Published - 2001 |
Event | 44th Annual Technical Conference Prodeedings - Philadelphia, PA, United States Duration: Apr 21 2001 → Apr 26 2001 |
Keywords
- Chemical properties
- Mechanical properties
- Nitrides
- Wear-resistant coatings
ASJC Scopus subject areas
- Fluid Flow and Transfer Processes
- Mechanical Engineering
- Surfaces, Coatings and Films
- Surfaces and Interfaces