Growth and analysis of binary and ternary nitride coatings using spectroscopic ellipsometry

S. M. Aouadi, T. Z. Gorishnyy, S. L. Rohde, E. Tobin, F. Namavar

Research output: Contribution to journalConference articlepeer-review

Abstract

The goal of this study was to show that in situ spectroscopic ellipsometry (SE) is a production worthy technique for process monitoring and control of PVD binary and ternary nitride films. To achieve this goal, monolithic coatings of Cr-N, Ti-N, Ti-B-N, and Cr-B-N were deposited by ion beam assisted evaporation. Ex situ SE was used successfully to identify the chemical composition of films grown under different deposition conditions. The SE compositions were found to correlate with X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering (RBS) results.

Original languageEnglish (US)
Pages (from-to)9-12
Number of pages4
JournalProceedings, Annual Technical Conference - Society of Vacuum Coaters
StatePublished - 2001
Event44th Annual Technical Conference Prodeedings - Philadelphia, PA, United States
Duration: Apr 21 2001Apr 26 2001

Keywords

  • Chemical properties
  • Mechanical properties
  • Nitrides
  • Wear-resistant coatings

ASJC Scopus subject areas

  • Mechanical Engineering
  • Surfaces and Interfaces
  • Fluid Flow and Transfer Processes
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Growth and analysis of binary and ternary nitride coatings using spectroscopic ellipsometry'. Together they form a unique fingerprint.

Cite this