Growth of [100]-textured gadolinium nitride films by CVD

Joseph R. Brewer, Zane Gernhart, Hsin Yu Liu, Chin Li Cheung

Research output: Contribution to journalArticle

9 Scopus citations

Abstract

Textured gadolinium nitride (GdN) thin films grown on (100) lanthanum aluminum oxide substrates were prepared by chemical vapor deposition with gadolinium chloride and ammonia. The films were found to have a (100) planar orientation and a growth rate of 102±5nm/min. Xray diffraction patterns show that the (200) reflection peaks from these GdN films have full widths at half maximum of ca. 1.2°.

Original languageEnglish (US)
Pages (from-to)216-219
Number of pages4
JournalChemical Vapor Deposition
Volume16
Issue number7-9
DOIs
StatePublished - Sep 2010

ASJC Scopus subject areas

  • Chemistry(all)
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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