Growth of diamond by rf plasma assisted chemical vapor deposition

Duane E. Meyer, Natale J. Ianno, John A. Woollam, B. Swartzlander, A. J. Nelson

Research output: Contribution to journalArticle

Abstract

Diamond particles have been produced by inductively coupled radio frequency plasma assisted chemical vapor deposition. Analysis indicates that particles having a thin graphitic surface, as well as diamond particles with no surface coatings have been deposited. Scanning electron microscopy analysis shows that particles are deposited on a pedestal which Auger spectroscopy indicates to be graphitic. This phenomenon has not been previously reported in the literature.

Original languageEnglish (US)
Pages (from-to)66-69
Number of pages4
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume969
DOIs
StatePublished - Jan 17 1989

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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