Hardware and software for in-situ process monitor and control using multiple wavelength ellipsometry

Blaine Johs, David Doerr, Shakil Pittal, John A. Woollan, Ishwara Bhat, S. Dakshinamurthy

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

We have built and tested a low-cost ellipsometer which acquires data in the spectral range 400-800 nm at multiple (up to 44) wavelengths simultaneously in less than 1 s. A personal computer is used to acquire data and analyze the data in real time for studies of time dependent phenomena. In addition, this permits feedback control which we have demonstrated on epitaxial growth of CdTe on GaAs by metal organic chemical vapor deposition.

Original languageEnglish (US)
Pages (from-to)680-682
Number of pages3
JournalSurface and Coatings Technology
Volume62
Issue number1-3
DOIs
StatePublished - Dec 10 1993

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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