Hardware and software for in-situ process monitor and control using multiple wavelength ellipsometry

Blaine Johs; David Doerr; Shakil Pittal; John A. Woollan; Ishwara Bhat; S. Dakshinamurthy

doi:10.1016/0257-8972(93)90318-I

Hardware and software for in-situ process monitor and control using multiple wavelength ellipsometry

Blaine Johs, David Doerr, Shakil Pittal, John A. Woollan, Ishwara Bhat, S. Dakshinamurthy

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

We have built and tested a low-cost ellipsometer which acquires data in the spectral range 400-800 nm at multiple (up to 44) wavelengths simultaneously in less than 1 s. A personal computer is used to acquire data and analyze the data in real time for studies of time dependent phenomena. In addition, this permits feedback control which we have demonstrated on epitaxial growth of CdTe on GaAs by metal organic chemical vapor deposition.

Original language	English (US)
Pages (from-to)	680-682
Number of pages	3
Journal	Surface and Coatings Technology
Volume	62
Issue number	1-3
DOIs	https://doi.org/10.1016/0257-8972(93)90318-I
State	Published - Dec 10 1993
Externally published	Yes

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/0257-8972(93)90318-I

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abstract = "We have built and tested a low-cost ellipsometer which acquires data in the spectral range 400-800 nm at multiple (up to 44) wavelengths simultaneously in less than 1 s. A personal computer is used to acquire data and analyze the data in real time for studies of time dependent phenomena. In addition, this permits feedback control which we have demonstrated on epitaxial growth of CdTe on GaAs by metal organic chemical vapor deposition.",

author = "Blaine Johs and David Doerr and Shakil Pittal and Woollan, {John A.} and Ishwara Bhat and S. Dakshinamurthy",

note = "Funding Information: Research was supported by the Advanced Research",

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T1 - Hardware and software for in-situ process monitor and control using multiple wavelength ellipsometry

AU - Johs, Blaine

AU - Doerr, David

AU - Pittal, Shakil

AU - Woollan, John A.

AU - Bhat, Ishwara

AU - Dakshinamurthy, S.

N1 - Funding Information: Research was supported by the Advanced Research

PY - 1993/12/10

Y1 - 1993/12/10

N2 - We have built and tested a low-cost ellipsometer which acquires data in the spectral range 400-800 nm at multiple (up to 44) wavelengths simultaneously in less than 1 s. A personal computer is used to acquire data and analyze the data in real time for studies of time dependent phenomena. In addition, this permits feedback control which we have demonstrated on epitaxial growth of CdTe on GaAs by metal organic chemical vapor deposition.

AB - We have built and tested a low-cost ellipsometer which acquires data in the spectral range 400-800 nm at multiple (up to 44) wavelengths simultaneously in less than 1 s. A personal computer is used to acquire data and analyze the data in real time for studies of time dependent phenomena. In addition, this permits feedback control which we have demonstrated on epitaxial growth of CdTe on GaAs by metal organic chemical vapor deposition.

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JF - Surface and Coatings Technology

IS - 1-3

ER -

Hardware and software for in-situ process monitor and control using multiple wavelength ellipsometry

Abstract

ASJC Scopus subject areas

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