High pressure annealing of HVPE GaN free-standing films: Redistribution of defects and stress

T. Paskova, T. Suski, M. Bockowski, P. P. Paskov, V. Darakchieva, B. Monemar, F. Tuomisto, K. Saarinen, N. Ashkenov, M. Schubert, C. Roder, D. Hommel

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