In situ and ex situ applications of spectroscopic ellipsometry

John A. Woollam; Blaine Johs; William A. McGahan; Paul G. Snyder; Jeffrey Hale; Huade Walter Yao

In situ and ex situ applications of spectroscopic ellipsometry

John A. Woollam, Blaine Johs, William A. McGahan, Paul G. Snyder, Jeffrey Hale, Huade Walter Yao

Electrical & Computer Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

4 Scopus citations

Abstract

We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.

Original language	English (US)
Title of host publication	Diagnostic Techniques for Semiconductor Materials Processing
Publisher	Publ by Materials Research Society
Pages	15-25
Number of pages	11
ISBN (Print)	1558992235
State	Published - 1994
Event	Proceedings of the 1993 Fall Meeting of the Materials Research Society - Boston, MA, USA Duration: Nov 29 1993 → Dec 2 1993

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	324
ISSN (Print)	0272-9172

Other

Other	Proceedings of the 1993 Fall Meeting of the Materials Research Society
City	Boston, MA, USA
Period	11/29/93 → 12/2/93

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Cite this

In situ and ex situ applications of spectroscopic ellipsometry. / Woollam, John A.; Johs, Blaine; McGahan, William A. et al.
Diagnostic Techniques for Semiconductor Materials Processing. Publ by Materials Research Society, 1994. p. 15-25 (Materials Research Society Symposium Proceedings; Vol. 324).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Woollam, JA, Johs, B, McGahan, WA, Snyder, PG, Hale, J & Yao, HW 1994, In situ and ex situ applications of spectroscopic ellipsometry. in Diagnostic Techniques for Semiconductor Materials Processing. Materials Research Society Symposium Proceedings, vol. 324, Publ by Materials Research Society, pp. 15-25, Proceedings of the 1993 Fall Meeting of the Materials Research Society, Boston, MA, USA, 11/29/93.

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title = "In situ and ex situ applications of spectroscopic ellipsometry",

abstract = "We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.",

author = "Woollam, {John A.} and Blaine Johs and McGahan, {William A.} and Snyder, {Paul G.} and Jeffrey Hale and Yao, {Huade Walter}",

year = "1994",

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series = "Materials Research Society Symposium Proceedings",

publisher = "Publ by Materials Research Society",

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note = "Proceedings of the 1993 Fall Meeting of the Materials Research Society ; Conference date: 29-11-1993 Through 02-12-1993",

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AU - Woollam, John A.

AU - Johs, Blaine

AU - McGahan, William A.

AU - Snyder, Paul G.

AU - Hale, Jeffrey

AU - Yao, Huade Walter

PY - 1994

Y1 - 1994

N2 - We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.

AB - We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.

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M3 - Conference contribution

AN - SCOPUS:0028092635

SN - 1558992235

T3 - Materials Research Society Symposium Proceedings

SP - 15

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BT - Diagnostic Techniques for Semiconductor Materials Processing

PB - Publ by Materials Research Society

T2 - Proceedings of the 1993 Fall Meeting of the Materials Research Society

Y2 - 29 November 1993 through 2 December 1993

ER -

In situ and ex situ applications of spectroscopic ellipsometry

Abstract

Publication series

Other

ASJC Scopus subject areas

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