In-situ Ellipsometry and in-situ Raman thin film growth monitoring

Mathias Schubert, Carsten Bundesmann, Nurdin Ashkenov, Eva Schubert, Horst Neumann, Gerd Lippold

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Fast and reliable optical in-situ process diagnostics by spectroscopic ellipsometry and Raman scattering spectroscopy is demonstrated. Applications include design and control of dielectric multilayer mirros for soft-x-ray applications and solar cell absorber layers deposited within a roll-toroll system.

Original languageEnglish (US)
Title of host publicationOptical Interference Coatings, OIC 2004
PublisherOptica Publishing Group (formerly OSA)
ISBN (Electronic)3540003649
StatePublished - 2004
Externally publishedYes
EventOptical Interference Coatings, OIC 2004 - Tucson, United States
Duration: Jun 27 2004Jul 2 2004

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceOptical Interference Coatings, OIC 2004
Country/TerritoryUnited States
CityTucson
Period6/27/047/2/04

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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