TY - JOUR
T1 - In-situ monitor and control using fast spectroscopic ellipsometry
AU - Woollam, John A.
AU - Gao, Xiang
AU - Heckens, Scott
AU - Hilfiker, James N.
N1 - Funding Information:
This research was supported by the National Science Foundation, grants NSF-DMR- 9222976, and NSF-OSR- 9255225.
Funding Information:
This research was supported by the National Science Foundation, grants NSF-DMR-9222976, and NSF-OSR-9255225.
Publisher Copyright:
© 1996 SPIE. All rights reserved.
PY - 1996/8/16
Y1 - 1996/8/16
N2 - A four gun magnetron sputter deposition chamber equipped with in-situ spectroscopic ellipsometry is described, and the results of precisely controlled multilayered metallic and dielectric materials are reported. These structures have applications in magneto-optic memories, as well as giant magneto resistance (GMR) and spin-valve magnetic readheads.
AB - A four gun magnetron sputter deposition chamber equipped with in-situ spectroscopic ellipsometry is described, and the results of precisely controlled multilayered metallic and dielectric materials are reported. These structures have applications in magneto-optic memories, as well as giant magneto resistance (GMR) and spin-valve magnetic readheads.
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U2 - 10.1117/12.246202
DO - 10.1117/12.246202
M3 - Conference article
AN - SCOPUS:84904220218
SN - 0277-786X
VL - 2873
SP - 140
EP - 143
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
T2 - International Symposium on Polarization Analysis and Applications to Device Technology 1996
Y2 - 12 June 1996 through 14 June 1996
ER -