In-situ monitoring of MOVPE growth with reflectance anisotropy spectroscopy in an industrial used multi wafer reactor

C. Krahmer, M. Philippens, M. Schubert, K. Streubel O

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

We investigated structures grown in an industrial used multi wafer MOVPE reactor, in order to understand the influence of the growth parameters on the RAS spectra. We investigated the effect of p- and ntype doping on the RAS spectra of different materials important for optoelectronic devices such as AlGaAs and InGaAlP. Furthermore, the effect of ordering in GaInP layers on the RAS spectra has been studied. Growth parameters such as substrate misorientation, growth temperature and doping level have been varied in order to study different degrees of ordering in AlGaInP.

Original languageEnglish (US)
Pages (from-to)655-658
Number of pages4
JournalPhysica Status Solidi C: Conferences
Volume3
Issue number3
DOIs
StatePublished - 2006
Event32nd International Symposium on Compound Semiconductors, ISCS-2005 - Rust, Germany
Duration: Sep 18 2005Sep 22 2005

ASJC Scopus subject areas

  • Condensed Matter Physics

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