Iridium substrates for space contamination studies: Erosion rates under atomic oxygen exposure

Research output: Contribution to journalConference articlepeer-review

Abstract

Iridium metals films are currently being considered as substrates for the study of contamination layers deposited in the space environment. In situ spectroscopic ellipsometry has been applied to monitor the oxygen plasma etching of iridium/chromium/fused silica, using an electron cyclotron resonance plasma source to simulate the low earth orbital environment. The analyses of the spectroscopic Psi and Delta data at selected time slices suggest that the iridium film has been etched away gradually (∼3.2 nm per year in LEO) upon plasma irradiation while showing no signs of oxidation or other chemical changes. Results indicate that, despite the thickness loss, iridium metals can indeed be used in space contamination studies.

Original languageEnglish (US)
Pages (from-to)509-513
Number of pages5
JournalEuropean Space Agency, (Special Publication) ESA SP
Issue number540
StatePublished - 2003
EventProceedings of the 9th International Symposium on Materials in a Space Environment - Noordwijk, Netherlands
Duration: Jun 16 2003Jun 20 2003

ASJC Scopus subject areas

  • Aerospace Engineering
  • Space and Planetary Science

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