TY - JOUR
T1 - Large-Area 2D/3D MoS2–MoO2 Heterostructures with Thermally Stable Exciton and Intriguing Electrical Transport Behaviors
AU - Li, Dawei
AU - Xiao, Zhiyong
AU - Golgir, Hossein Rabiee
AU - Jiang, Lijia
AU - Singh, Vijay Raj
AU - Keramatnejad, Kamran
AU - Smith, Kevin E.
AU - Hong, Xia
AU - Jiang, Lan
AU - Silvain, Jean Francois
AU - Lu, Yongfeng
N1 - Funding Information:
D.W.L. and Z.Y.X. contributed equally to this work. This research was financially supported by the National Science Foundation [CMMI 1068510, CMMI 1129613, CMMI 1265122, and DMR 1148783 (low temperature electrical characterization)], the U.S. Department of Energy (DOE), Office of Science, Basic Energy Sciences (BES), under Award # DE-SC0016153 (scanning probe studies), and the Nebraska Center for Energy Science Research.
Publisher Copyright:
© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2017/7/1
Y1 - 2017/7/1
N2 - To date, scale-up fabrication of transition metal dichalcogenide (TMD-) based 2D/2D or 2D/3D heterostructures with specific functionalities is still a great challenge. This study, for the first time, reports on the controllable synthesis of large-area and continuous 2D/3D semiconductor/metal heterostructures consisting of monolayer MoS2 and bulk MoO2 with unique electrical and optical properties via one-step, vapor-transport-assisted rapid thermal processing. The temperature-dependent electrical transport measurements reveal that the 2D/3D MoS2–MoO2 heterostructure grown on SiO2/Si substrates exhibits metallic phase, while this heterostructure becomes a low-resistance semiconductor when it is grown on fused silica, which is attributed to the different degrees of sulfurization on different substrates, as being confirmed by surface potential analyses. Photoluminescence measurements taken on the MoS2–MoO2 heterostructures reveal the simultaneous presence of both negative trions and neutral excitons, while only neutral excitons are observed in the monolayer MoS2. The trion-binding energy is determined to be ≈27 meV, and the trion signal persists up to 330 K, indicating significant stability at room temperature. This work not only provides a new platform for understanding the intriguing physics in TMD-based heterostructures but also enables the design of more complicated devices with potential applications in nanoelectronics and nanophotonics.
AB - To date, scale-up fabrication of transition metal dichalcogenide (TMD-) based 2D/2D or 2D/3D heterostructures with specific functionalities is still a great challenge. This study, for the first time, reports on the controllable synthesis of large-area and continuous 2D/3D semiconductor/metal heterostructures consisting of monolayer MoS2 and bulk MoO2 with unique electrical and optical properties via one-step, vapor-transport-assisted rapid thermal processing. The temperature-dependent electrical transport measurements reveal that the 2D/3D MoS2–MoO2 heterostructure grown on SiO2/Si substrates exhibits metallic phase, while this heterostructure becomes a low-resistance semiconductor when it is grown on fused silica, which is attributed to the different degrees of sulfurization on different substrates, as being confirmed by surface potential analyses. Photoluminescence measurements taken on the MoS2–MoO2 heterostructures reveal the simultaneous presence of both negative trions and neutral excitons, while only neutral excitons are observed in the monolayer MoS2. The trion-binding energy is determined to be ≈27 meV, and the trion signal persists up to 330 K, indicating significant stability at room temperature. This work not only provides a new platform for understanding the intriguing physics in TMD-based heterostructures but also enables the design of more complicated devices with potential applications in nanoelectronics and nanophotonics.
KW - electrical transport
KW - optical transitions
KW - rapid thermal processing
KW - semiconductor/metal heterostructures
KW - transition metal dichalcogenides
UR - http://www.scopus.com/inward/record.url?scp=85018698366&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85018698366&partnerID=8YFLogxK
U2 - 10.1002/aelm.201600335
DO - 10.1002/aelm.201600335
M3 - Article
AN - SCOPUS:85018698366
SN - 2199-160X
VL - 3
JO - Advanced Electronic Materials
JF - Advanced Electronic Materials
IS - 7
M1 - 1600335
ER -