Laser-assisted imprinting of self-assembled nanostructures

H. Wang, Y. F. Lu, Z. Y. Yang

Research output: Contribution to conferencePaper

Abstract

Nanoscale structuring is a promising area in which the various processing methods are being developed. Based on the advantages of laser processing, associated with improved self-assembly technique, it is very effective to fabricate nanoscale structures, such as 3-D photonic bandgap structures, especially on the materials with high hardness and high melting point. This new approach to fabricating 3-D photonic bandgap structures on silicon will be presented. Self-assembly technique was used to deposit multi-layer of silica microparticles with a size of 0.81 μm. A pulsed KrF excimer laser (23 ns, 248 nm) was applied as the imprinting energy source.

Original languageEnglish (US)
StatePublished - Nov 28 2006
EventInternational Conference on Manufacturing Science and Engineering, MSEC 2006 - Ypsilanti, MI, United States
Duration: Oct 8 2006Oct 11 2006

Conference

ConferenceInternational Conference on Manufacturing Science and Engineering, MSEC 2006
CountryUnited States
CityYpsilanti, MI
Period10/8/0610/11/06

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Wang, H., Lu, Y. F., & Yang, Z. Y. (2006). Laser-assisted imprinting of self-assembled nanostructures. Paper presented at International Conference on Manufacturing Science and Engineering, MSEC 2006, Ypsilanti, MI, United States.