Abstract
Nanoscale structuring is a promising area in which the easiest and effective processing methods are being developed. Based on the advantage of lasers, associated with improved self-assembly technique, it is very effective to fabricate nanoscale structures, such as 3-D photonic bandgap structures, using laser-assisted imprinting method, even on the materials with high hardness and high melting point, such as silicon. This new approach to fabricate 3-D photonic bandgap structures on silicon will be presented. Self-assembly technique was used to deposit multi-layer of silica microparticles with a size of 0.81 μm. A pulsed KrF excimer laser (23ns, 248 nm) was applied as the imprinting energy source.
Original language | English (US) |
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Pages | 152-156 |
Number of pages | 5 |
DOIs | |
State | Published - 2005 |
Event | 24th International Congress on Applications of Lasers and Electro-Optics, ICALEO 2005 - Miami, FL, United States Duration: Oct 31 2005 → Nov 3 2005 |
Conference
Conference | 24th International Congress on Applications of Lasers and Electro-Optics, ICALEO 2005 |
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Country/Territory | United States |
City | Miami, FL |
Period | 10/31/05 → 11/3/05 |
ASJC Scopus subject areas
- General Engineering