Laser-assisted imprinting of self-assembled nanostructures

H. Wang, K. K. Mendu, Y. F. Lu

Research output: Contribution to conferencePaper

Abstract

Nanoscale structuring is a promising area in which the easiest and effective processing methods are being developed. Based on the advantage of lasers, associated with improved self-assembly technique, it is very effective to fabricate nanoscale structures, such as 3-D photonic bandgap structures, using laser-assisted imprinting method, even on the materials with high hardness and high melting point, such as silicon. This new approach to fabricate 3-D photonic bandgap structures on silicon will be presented. Self-assembly technique was used to deposit multi-layer of silica microparticles with a size of 0.81 μm. A pulsed KrF excimer laser (23ns, 248 nm) was applied as the imprinting energy source.

Original languageEnglish (US)
Pages152-156
Number of pages5
DOIs
StatePublished - 2005
Event24th International Congress on Applications of Lasers and Electro-Optics, ICALEO 2005 - Miami, FL, United States
Duration: Oct 31 2005Nov 3 2005

Conference

Conference24th International Congress on Applications of Lasers and Electro-Optics, ICALEO 2005
CountryUnited States
CityMiami, FL
Period10/31/0511/3/05

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Wang, H., Mendu, K. K., & Lu, Y. F. (2005). Laser-assisted imprinting of self-assembled nanostructures. 152-156. Paper presented at 24th International Congress on Applications of Lasers and Electro-Optics, ICALEO 2005, Miami, FL, United States. https://doi.org/10.2351/1.5060541