Abstract
Laser assisted nanofabrication for surface nanopatterning is investigated. To overcome the limitation of light wavelength, pulsed lasers were applied to combine with atomic force microscope (AFM) and nanoparticle self-assembled mask to achieve sub-30 nm patterning on the metallic surfaces. The mechanisms of the formation of nanostructure patterns are discussed. Progress on numerical simulation and physical modeling of laser assisted nanofabrication has been demonstrated. The method of AFM tip or particle enhanced laser irradiation allows the study of field enhancement effects as well as its potential applications for nanolithography.
Original language | English (US) |
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Pages (from-to) | 142-155 |
Number of pages | 14 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 4977 |
DOIs | |
State | Published - 2003 |
Externally published | Yes |
Event | PROCEEDINGS OF SPIE SPIE - The International Society for Optical Engineering: Photon Processing in Microelectronics and Photonics II - San Jose, CA, United States Duration: Jan 27 2003 → Jan 30 2003 |
Keywords
- Laser irradiation
- Mie scattering
- Nanostructuring
- Near field
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering