Laser-induced dry cleaning in air—a new surface cleaning technology in lieu of carbon fluorochloride (Cfc) solvents

Yong Feng Lu, Yoshinobu Aoyagi

Research output: Contribution to journalArticle

27 Scopus citations

Abstract

Surface contaminations are removed by laser irradiation with pulse output and short wavelength. It is a new dry cleaning process to remove surface organic contaminations without using ultrasonic cleaning with carbon fluorochloride (CFC) and other organic solvents. This provides a new dry process to clean different substrate sur-faces and can take the place of conventional wet cleaning processes such as ultrasonic cleaning with CFC and other organic solvents. The mechanisms of laser cleaning may include laser photodecomposition, laser ablation and surface vibration due to the impact of laser pulse.

Original languageEnglish (US)
Pages (from-to)L430-L433
JournalJapanese Journal of Applied Physics
Volume33
Issue number3
DOIs
StatePublished - Mar 1994

Keywords

  • CFC-free cleaning
  • Dry process
  • Fingerprint removal
  • Laser cleaning
  • Magnetic head cleaning
  • Metal surface cleaning
  • Surface cleaning
  • UV pulse laser

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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