Laser-induced dry cleaning in air—a new surface cleaning technology in lieu of carbon fluorochloride (Cfc) solvents

Yong Feng Lu; Yoshinobu Aoyagi

doi:10.1143/JJAP.33.L430

Laser-induced dry cleaning in air—a new surface cleaning technology in lieu of carbon fluorochloride (Cfc) solvents

Yong Feng Lu, Yoshinobu Aoyagi

Research output: Contribution to journal › Article › peer-review

27 Scopus citations

Abstract

Surface contaminations are removed by laser irradiation with pulse output and short wavelength. It is a new dry cleaning process to remove surface organic contaminations without using ultrasonic cleaning with carbon fluorochloride (CFC) and other organic solvents. This provides a new dry process to clean different substrate sur-faces and can take the place of conventional wet cleaning processes such as ultrasonic cleaning with CFC and other organic solvents. The mechanisms of laser cleaning may include laser photodecomposition, laser ablation and surface vibration due to the impact of laser pulse.

Original language	English (US)
Pages (from-to)	L430-L433
Journal	Japanese Journal of Applied Physics
Volume	33
Issue number	3
DOIs	https://doi.org/10.1143/JJAP.33.L430
State	Published - Mar 1994
Externally published	Yes

Keywords

CFC-free cleaning
Dry process
Fingerprint removal
Laser cleaning
Magnetic head cleaning
Metal surface cleaning
Surface cleaning
UV pulse laser

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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title = "Laser-induced dry cleaning in air—a new surface cleaning technology in lieu of carbon fluorochloride (Cfc) solvents",

abstract = "Surface contaminations are removed by laser irradiation with pulse output and short wavelength. It is a new dry cleaning process to remove surface organic contaminations without using ultrasonic cleaning with carbon fluorochloride (CFC) and other organic solvents. This provides a new dry process to clean different substrate sur-faces and can take the place of conventional wet cleaning processes such as ultrasonic cleaning with CFC and other organic solvents. The mechanisms of laser cleaning may include laser photodecomposition, laser ablation and surface vibration due to the impact of laser pulse.",

keywords = "CFC-free cleaning, Dry process, Fingerprint removal, Laser cleaning, Magnetic head cleaning, Metal surface cleaning, Surface cleaning, UV pulse laser",

author = "Lu, {Yong Feng} and Yoshinobu Aoyagi",

year = "1994",

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doi = "10.1143/JJAP.33.L430",

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N2 - Surface contaminations are removed by laser irradiation with pulse output and short wavelength. It is a new dry cleaning process to remove surface organic contaminations without using ultrasonic cleaning with carbon fluorochloride (CFC) and other organic solvents. This provides a new dry process to clean different substrate sur-faces and can take the place of conventional wet cleaning processes such as ultrasonic cleaning with CFC and other organic solvents. The mechanisms of laser cleaning may include laser photodecomposition, laser ablation and surface vibration due to the impact of laser pulse.

AB - Surface contaminations are removed by laser irradiation with pulse output and short wavelength. It is a new dry cleaning process to remove surface organic contaminations without using ultrasonic cleaning with carbon fluorochloride (CFC) and other organic solvents. This provides a new dry process to clean different substrate sur-faces and can take the place of conventional wet cleaning processes such as ultrasonic cleaning with CFC and other organic solvents. The mechanisms of laser cleaning may include laser photodecomposition, laser ablation and surface vibration due to the impact of laser pulse.

KW - CFC-free cleaning

KW - Dry process

KW - Fingerprint removal

KW - Laser cleaning

KW - Magnetic head cleaning

KW - Metal surface cleaning

KW - Surface cleaning

KW - UV pulse laser

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Laser-induced dry cleaning in air—a new surface cleaning technology in lieu of carbon fluorochloride (Cfc) solvents

Abstract

Keywords

ASJC Scopus subject areas

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