Laser-induced etching of mn-zn ferrite an its application

Yong Feng Lu, Mikio Takai, Syohei Nagatomo, Tadanori Minamisono, Susumu Namba

Research output: Contribution to journalArticle

25 Scopus citations


Single-crystalline ferrite was masklessly etched by focused Ar+ laser irradiation in CCl4 gas and in H3PO4 solution. Etching rates up to 68 µm/s in CCl4 and 340 µm/s in H3PO4 have been achieved by laser processes. Bending of the etched narrow groove was observed in CCl4 gas due to the enhanced reflection caused by the polarization of the laser beam when focused by a microscope objective lens. A vertical slab structure with a high aspect ratio of up to 40 has been obtained by the light-guiding effect of the laser beam in wet-chemical etching. RBS analysis of the processed surface revealed that laser-induced damage was much lower than that induced by mechanical polishing.

Original languageEnglish (US)
Pages (from-to)2151-2156
Number of pages6
JournalJapanese Journal of Applied Physics
Issue number10 R
StatePublished - Oct 1989


  • Ceramics
  • Dry chemical etching
  • Laser process
  • Mn-Zn ferrite
  • Wet chemical etching

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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