Magnetic domain patterns of rectangular and elliptic arrays of small permalloy elements

S. H. Liou; R. F. Sabiryanov; S. S. Jaswal; J. C. Wu; Y. D. Yao

doi:10.1016/S0304-8853(01)00073-7

Magnetic domain patterns of rectangular and elliptic arrays of small permalloy elements

S. H. Liou, R. F. Sabiryanov, S. S. Jaswal, J. C. Wu, Y. D. Yao

Research output: Contribution to journal › Article › peer-review

32 Scopus citations

Abstract

Magnetic domain patterns of two series of soft magnetic arrays are studied as functions of the aspect ratios. The magnetic images are obtained by using MFM with low magnetic stray field and high-coercivity MFM tips. A 30 nm thick layer of Ni₈₀Fe₂₀ alloy is prepared by thermal evaporation and electron beam lithography and lift-off patterning technique on a silicon substrate. The effect of the edge roughness and initial conditions on the magnetic domain patterns is compared with the results obtained by micromagnetic simulations. This comparison clearly shows that the domain structure is related to the edge roughness.

Original language	English (US)
Pages (from-to)	1270-1272
Number of pages	3
Journal	Journal of Magnetism and Magnetic Materials
Volume	226-230
Issue number	PART II
DOIs	https://doi.org/10.1016/S0304-8853(01)00073-7
State	Published - 2001

Keywords

Domain structure
Magnetic force microscopy
Micromagnetic calculation
Permalloy

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

Access to Document

10.1016/S0304-8853(01)00073-7

Cite this

@article{00587481247245fcb2a54c2e6a139904,

title = "Magnetic domain patterns of rectangular and elliptic arrays of small permalloy elements",

abstract = "Magnetic domain patterns of two series of soft magnetic arrays are studied as functions of the aspect ratios. The magnetic images are obtained by using MFM with low magnetic stray field and high-coercivity MFM tips. A 30 nm thick layer of Ni80Fe20 alloy is prepared by thermal evaporation and electron beam lithography and lift-off patterning technique on a silicon substrate. The effect of the edge roughness and initial conditions on the magnetic domain patterns is compared with the results obtained by micromagnetic simulations. This comparison clearly shows that the domain structure is related to the edge roughness.",

keywords = "Domain structure, Magnetic force microscopy, Micromagnetic calculation, Permalloy",

author = "Liou, {S. H.} and Sabiryanov, {R. F.} and Jaswal, {S. S.} and Wu, {J. C.} and Yao, {Y. D.}",

note = "Funding Information: Research supported by Army Research Office, grant DAAG55-98-1-0014 and Nebraska Research Initiative grant. R.F. Sabiryanov, and S.S. Jaswal were supported by the NSF.",

year = "2001",

doi = "10.1016/S0304-8853(01)00073-7",

language = "English (US)",

volume = "226-230",

pages = "1270--1272",

journal = "Journal of Magnetism and Magnetic Materials",

issn = "0304-8853",

publisher = "Elsevier B.V.",

number = "PART II",

}

TY - JOUR

T1 - Magnetic domain patterns of rectangular and elliptic arrays of small permalloy elements

AU - Liou, S. H.

AU - Sabiryanov, R. F.

AU - Jaswal, S. S.

AU - Wu, J. C.

AU - Yao, Y. D.

N1 - Funding Information: Research supported by Army Research Office, grant DAAG55-98-1-0014 and Nebraska Research Initiative grant. R.F. Sabiryanov, and S.S. Jaswal were supported by the NSF.

PY - 2001

Y1 - 2001

N2 - Magnetic domain patterns of two series of soft magnetic arrays are studied as functions of the aspect ratios. The magnetic images are obtained by using MFM with low magnetic stray field and high-coercivity MFM tips. A 30 nm thick layer of Ni80Fe20 alloy is prepared by thermal evaporation and electron beam lithography and lift-off patterning technique on a silicon substrate. The effect of the edge roughness and initial conditions on the magnetic domain patterns is compared with the results obtained by micromagnetic simulations. This comparison clearly shows that the domain structure is related to the edge roughness.

AB - Magnetic domain patterns of two series of soft magnetic arrays are studied as functions of the aspect ratios. The magnetic images are obtained by using MFM with low magnetic stray field and high-coercivity MFM tips. A 30 nm thick layer of Ni80Fe20 alloy is prepared by thermal evaporation and electron beam lithography and lift-off patterning technique on a silicon substrate. The effect of the edge roughness and initial conditions on the magnetic domain patterns is compared with the results obtained by micromagnetic simulations. This comparison clearly shows that the domain structure is related to the edge roughness.

KW - Domain structure

KW - Magnetic force microscopy

KW - Micromagnetic calculation

KW - Permalloy

UR - http://www.scopus.com/inward/record.url?scp=0035327968&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035327968&partnerID=8YFLogxK

U2 - 10.1016/S0304-8853(01)00073-7

DO - 10.1016/S0304-8853(01)00073-7

M3 - Article

AN - SCOPUS:0035327968

SN - 0304-8853

VL - 226-230

SP - 1270

EP - 1272

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

IS - PART II

ER -

Magnetic domain patterns of rectangular and elliptic arrays of small permalloy elements

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this