Modeling of a-Si: H deposition in a dc glow discharge reactor

Engineering & Materials Science

• Glow discharges 100%
• Deposition rates 86%
• Electrons 67%
• Hydrogen 53%
• Boltzmann equation 51%
• Plasma enhanced chemical vapor deposition 47%
• Amorphous silicon 46%
• Ionization 43%
• Silanes 43%
• Positive ions 42%
• Rate constants 41%
• Distribution functions 34%
• Cathodes 33%
• Anodes 32%
• Plasmas 31%
• Sensitivity analysis 29%
• Electric potential 17%
• Temperature 13%

Chemical Compounds

• Glow Discharge 80%
• Silyl 73%
• Boltzmann Equation 56%
• Dissociation 48%
• Disilane 47%
• Distribution Function 41%
• Electron Particle 36%
• Hydrogen 34%
• Silane 32%
• Ionization 26%
• Anode 24%
• Cathode 24%
• Voltage 24%
• Amorphous Material 23%
• Rate Constant 22%
• Flow 21%
• Plasma 20%
• Length 20%
• Chemistry 19%
• Pressure 19%
• Energy 15%

Physics & Astronomy

• glow discharges 67%
• reactors 51%
• dissociation 27%
• plasma chemistry 23%
• hydrogen 20%
• sensitivity analysis 20%
• silanes 18%
• positive ions 18%
• parallel plates 17%
• amorphous silicon 15%
• energy distribution 14%
• anodes 14%
• manufacturing 14%
• cathodes 13%
• distribution functions 13%
• electron energy 12%
• ionization 11%
• sensitivity 9%
• electric potential 9%
• configurations 9%
• electronics 8%
• electrons 7%