NVESD microfactory: A new approach to Infrared Focal Plane Array manufacturing

J. H. Dinan, J. D. Benson, A. B. Cornfeld, M. Martinka, J. N. Johnson, J. Bratton, P. Taylor, B. Johs, P. He, S. Pittal, John A. Woollam

Research output: Contribution to conferencePaper

2 Scopus citations

Abstract

A novel approach to Infrared Focal Plane Array fabrication is being investigated at the US Army Night Vision & Electronics Sensors Directorate. The goal is a demonstration of the feasibility of carrying out all epitaxial growth and device processing steps without removing a wafer from the protective environment of a multi-chamber vacuum system.

Original languageEnglish (US)
Pages205-211
Number of pages7
StatePublished - 1996
EventProceedings of the 1996 IEEE/CPMT 19th International Electronics Manufacturing Technology Symposium - Austin, TX, USA
Duration: Oct 14 1996Oct 16 1996

Other

OtherProceedings of the 1996 IEEE/CPMT 19th International Electronics Manufacturing Technology Symposium
CityAustin, TX, USA
Period10/14/9610/16/96

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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    Dinan, J. H., Benson, J. D., Cornfeld, A. B., Martinka, M., Johnson, J. N., Bratton, J., Taylor, P., Johs, B., He, P., Pittal, S., & Woollam, J. A. (1996). NVESD microfactory: A new approach to Infrared Focal Plane Array manufacturing. 205-211. Paper presented at Proceedings of the 1996 IEEE/CPMT 19th International Electronics Manufacturing Technology Symposium, Austin, TX, USA, .