NVESD microfactory: A new approach to Infrared Focal Plane Array manufacturing

J. H. Dinan; J. D. Benson; A. B. Cornfeld; M. Martinka; J. N. Johnson; J. Bratton; P. Taylor; B. Johs; P. He; S. Pittal; John A. Woollam

NVESD microfactory: A new approach to Infrared Focal Plane Array manufacturing

J. H. Dinan, J. D. Benson, A. B. Cornfeld, M. Martinka, J. N. Johnson, J. Bratton, P. Taylor, B. Johs, P. He, S. Pittal, John A. Woollam

Research output: Contribution to conference › Paper › peer-review

2 Scopus citations

Abstract

A novel approach to Infrared Focal Plane Array fabrication is being investigated at the US Army Night Vision & Electronics Sensors Directorate. The goal is a demonstration of the feasibility of carrying out all epitaxial growth and device processing steps without removing a wafer from the protective environment of a multi-chamber vacuum system.

Original language	English (US)
Pages	205-211
Number of pages	7
State	Published - 1996
Externally published	Yes
Event	Proceedings of the 1996 IEEE/CPMT 19th International Electronics Manufacturing Technology Symposium - Austin, TX, USA Duration: Oct 14 1996 → Oct 16 1996

Other

Other	Proceedings of the 1996 IEEE/CPMT 19th International Electronics Manufacturing Technology Symposium
City	Austin, TX, USA
Period	10/14/96 → 10/16/96

ASJC Scopus subject areas

Industrial and Manufacturing Engineering
Electrical and Electronic Engineering

Cite this

Dinan, J. H., Benson, J. D., Cornfeld, A. B., Martinka, M., Johnson, J. N., Bratton, J., Taylor, P., Johs, B., He, P., Pittal, S., & Woollam, J. A. (1996). NVESD microfactory: A new approach to Infrared Focal Plane Array manufacturing. 205-211. Paper presented at Proceedings of the 1996 IEEE/CPMT 19th International Electronics Manufacturing Technology Symposium, Austin, TX, USA.

Dinan, JH, Benson, JD, Cornfeld, AB, Martinka, M, Johnson, JN, Bratton, J, Taylor, P, Johs, B, He, P, Pittal, S & Woollam, JA 1996, 'NVESD microfactory: A new approach to Infrared Focal Plane Array manufacturing', Paper presented at Proceedings of the 1996 IEEE/CPMT 19th International Electronics Manufacturing Technology Symposium, Austin, TX, USA, 10/14/96 - 10/16/96 pp. 205-211.

@conference{37fb6a533795492a93a31a882df3b3c2,

title = "NVESD microfactory: A new approach to Infrared Focal Plane Array manufacturing",

abstract = "A novel approach to Infrared Focal Plane Array fabrication is being investigated at the US Army Night Vision & Electronics Sensors Directorate. The goal is a demonstration of the feasibility of carrying out all epitaxial growth and device processing steps without removing a wafer from the protective environment of a multi-chamber vacuum system.",

author = "Dinan, {J. H.} and Benson, {J. D.} and Cornfeld, {A. B.} and M. Martinka and Johnson, {J. N.} and J. Bratton and P. Taylor and B. Johs and P. He and S. Pittal and Woollam, {John A.}",

year = "1996",

language = "English (US)",

pages = "205--211",

note = "Proceedings of the 1996 IEEE/CPMT 19th International Electronics Manufacturing Technology Symposium ; Conference date: 14-10-1996 Through 16-10-1996",

}

TY - CONF

T1 - NVESD microfactory

T2 - Proceedings of the 1996 IEEE/CPMT 19th International Electronics Manufacturing Technology Symposium

AU - Dinan, J. H.

AU - Benson, J. D.

AU - Cornfeld, A. B.

AU - Martinka, M.

AU - Johnson, J. N.

AU - Bratton, J.

AU - Taylor, P.

AU - Johs, B.

AU - He, P.

AU - Pittal, S.

AU - Woollam, John A.

PY - 1996

Y1 - 1996

N2 - A novel approach to Infrared Focal Plane Array fabrication is being investigated at the US Army Night Vision & Electronics Sensors Directorate. The goal is a demonstration of the feasibility of carrying out all epitaxial growth and device processing steps without removing a wafer from the protective environment of a multi-chamber vacuum system.

AB - A novel approach to Infrared Focal Plane Array fabrication is being investigated at the US Army Night Vision & Electronics Sensors Directorate. The goal is a demonstration of the feasibility of carrying out all epitaxial growth and device processing steps without removing a wafer from the protective environment of a multi-chamber vacuum system.

UR - http://www.scopus.com/inward/record.url?scp=0030396572&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030396572&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:0030396572

SP - 205

EP - 211

Y2 - 14 October 1996 through 16 October 1996

ER -

NVESD microfactory: A new approach to Infrared Focal Plane Array manufacturing

Abstract

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ASJC Scopus subject areas

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