Optical and electronic characterization of a-SiGe:H thin films prepared by a novel hollow cathode deposition technique

Engineering & Materials Science

• Cathodes 84%
• Thin films 80%
• Spectroscopic ellipsometry 51%
• Reactive sputtering 45%
• Silicon 44%
• Plasma jets 43%
• Secondary ion mass spectrometry 42%
• Infrared spectroscopy 38%
• Germanium 38%
• Energy gap 32%
• Atoms 29%
• Plasmas 26%
• Nozzles 24%
• Lighting 22%
• Hydrogen 22%
• Glass 22%
• Substrates 20%

Physics & Astronomy

• hollow cathodes 100%
• characterization 47%
• electronics 44%
• thin films 43%
• conductivity 37%
• silicon 30%
• secondary ion mass spectrometry 29%
• ellipsometry 27%
• plasma jets 26%
• nozzles 26%
• infrared spectroscopy 25%
• germanium 25%
• sputtering 22%
• illumination 21%
• hydrogen 17%
• glass 16%
• atoms 14%

Chemical Compounds

• Deposition Technique 93%
• Cathode 62%
• Reactive Sputtering 42%
• Liquid Film 41%
• Conductivity 37%
• Nozzle 33%
• Ellipsometry 31%
• Secondary Ion Mass Spectroscopy 30%
• Glass Substrate 28%
• Illumination 25%
• Chemical Element 21%
• Band Gap 21%
• Flow 18%
• Plasma 17%
• Hydrogen 14%