Optical constants and roughness study of dc magnetron sputtered iridium films

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31 Scopus citations


Extremely smooth thin films of iridium have been deposited onto superpolished fused silica substrates using dc magnetron sputtering in an argon plasma. The influence of deposition process parameters on film microroughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometry, over the spectral range from vacuum ultraviolet to middle infrared (140 nm-35 μm). Because the Ir films were optically thick and the surface roughnesses were measured by atomic force microscopy then accounted for in the optical model, the as-determined film optical constants are expected to be the best available for Ir bulk metals, minimally affected by surface overlayers or microstructure.

Original languageEnglish (US)
Pages (from-to)4386-4392
Number of pages7
JournalJournal of Applied Physics
Issue number8
StatePublished - Oct 15 2002

ASJC Scopus subject areas

  • Physics and Astronomy(all)


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