Abstract
The use of ellipsometry and spectroscopic mode to monitor oxygen plasma etching of iridium was analyzed. It was observed that the etching of film of iridium was done on fused silica substrates using an electron cyclotron resonance plasma source. The nanoscale atomic mixing and index of refraction grading were also analyzed. It was found that the iridium films were etched upon plasma irradiation using spectroscopic psi and delta data.
Original language | English (US) |
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Pages (from-to) | 2177-2181 |
Number of pages | 5 |
Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
Volume | 22 |
Issue number | 5 |
DOIs | |
State | Published - Sep 2004 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films