Oxygen plasma ashing effects on aluminum and titanium space protective coatings

R. Synowicki, R. D. Kubik, J. S. Hale, Jane Peterkin, S. Nafis, John A. Woollam, S. Zaat

Research output: Contribution to journalArticlepeer-review

10 Scopus citations


Using variable angle spectroscopic ellipsometry and atomic force microscopy (AFM), the surface roughness and oxidation of aluminum and titanium thin films have been studied as a function of substrate deposition temperature and oxygen plasma exposure. Increasing substrate deposition temperatures affect film microstructure by greatly increasing grain size. Short exposures to an oxygen plasma environment produce sharp spikes rising rapidly above the surface as seen by AFM. Ellipsometric measurements were made over a wide range of plasma exposure times, and results at longer exposure times suggest that the surface is greater than 30% void. This is qualitatively verified by the AFM images.

Original languageEnglish (US)
Pages (from-to)254-258
Number of pages5
JournalThin Solid Films
Issue number1-2
StatePublished - Dec 10 1991

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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