Polarization-dependent elliptical crater morphologies formed on a silicon surface by single-shot femtosecond laser ablation

Xu Ji, Lan Jiang, Xiaowei Li, Weina Han, Yang Liu, Qiang Huang, Yongfeng Lu

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

Formation of the elliptical-shaped craters on a silicon surface is investigated comprehensively using a single shot of a femtosecond laser. It is observed that the ablation craters are elongated along the major axis of the polarization direction, while their orientation is parallel to the polarization direction. The ablation area grows and the morphology of the craters evolves from an ellipse to nearly a circle with increasing fluence. The underlying physical mechanism is revealed through numerical simulations that are based on the finite-difference time-domain technique. It is suggested that the initially formed craters or surface defects lead to the redistribution of the electric field on the silicon surface, which plays a crucial role in the creation of the elliptical-shaped craters. In addition, the field intensity becomes enhanced along the incident laser polarization direction, which determines the elliptical crater orientations.

Original languageEnglish (US)
Pages (from-to)6742-6748
Number of pages7
JournalApplied optics
Volume53
Issue number29
DOIs
StatePublished - Oct 10 2014

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

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